EP3257964

MANUFACTURING METHOD FOR DEPOSITION MASK, METAL SHEET USED FOR PRODUCING DEPOSITION MASK, AND MANUFACTURING METHOD FOR SAID METAL SHEET

granted
JurisdiktionEP
Anmeldedatum05. Feb. 2016
Veröffentlichungsdatum13. Nov. 2019
Erteilungsdatum13. Nov. 2019
Ablaufdatum05. Feb. 2036
Veröffentlichungsnr.EP3257964
Anmeldenr.EP16749177
UPC-Verfahren2

Zusammenfassung

[0001] The present invention provides a metal sheet, on a first surface of which a resist pattern having a narrow width can be stably provided. This manufacturing method for a metal sheet includes a preparation step of preparing a sheet material comprising an iron alloy that contains nickel. When a composition analysis of the first surface of the metal sheet obtained from the sheet material is performed using X-ray photoelectron spectroscopy, the ratio A1/A2 obtained by the result of the X-ray photoelectron spectroscopy does not exceed 0.4, where A1 is the sum of the peak area value of nickel oxide and the peak area value of nickel hydroxide, and A2 is the sum of the peak area value of iron oxide and the peak area value of iron hydroxide.

Anmelder

DAINIPPON PRINTING CO LTD [JP]

Erfinder

IKENAGA CHIKAO [JP]NAKAYAMA HIROAKI [JP]IKEDA KAZUNARI [JP]HATSUTA CHIAKI [JP]OOUCHI UTAKO [JP]

Externe Quellen

Klassifikation

IPC-Klassen
H05B 33/10C23C 14/04C23F 1/00H10K 99/00C21D 1/74C21D 6/00C22C 38/08C22C 38/40C23F 1/02C23F 1/28
CPC-Klassen
C21D 1/26C21D 1/74C21D 6/001C21D 8/02C22C 38/08C22C 38/40C23C 14/04C23C 14/042C23C 14/24C23C 14/58C23F 1/00C23F 1/02C23F 1/04C23F 1/28C25D 1/10G01N 23/2273H05B 33/10H10K 50/00H10K 71/00H10K 71/164
AI: ManufacturingChemistryElectronics
warum

Dainippon OLED deposition-mask manufacturing — H05B33 + C23C + C2x. Manufacturing primary (sheet-fabrication process); Chemistry secondary (alloy + surface chemistry); Electronics secondary (the end-product is a display-fabrication tool). Drift: rule had Electronics + Chemistry.

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